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Machinery > Products and Services > Advanced Technology Equipment > HRBS

Machinery
HRBS

High-resolution RBS Analysis Machine & Ion Beam Equipment
Thin Film Analysis
Thin film analyses such as concentration, crystallinity and thickness for semiconductor(Gate film like High-k, SiON etc.), magnetic(TMR, GMR, MRAM etc.) and organic thin films that have nano meter level thickness are available with angstrom(A) depth resolution.
Available analysis methods are RBS, HRBS, ERDA, HERDA, PIXE and NRA.
 
Thin Film Analysis System
 
HRBS-V500 Approx. ~100nm thickness (following figure)
HRBS-V500


HRBS-V500's photo
 
End Station
 
Only Analysis Chamber + Detector for HRBS-V500 can be provided.
End Station



EndStatiton's photo
 
Demo
 
Demo is available in our Takasago factory.
Ion Accelerators & Related Equipments
 
Ion Accelerators
 
Accelerators between 300kV and 500kV
Ion Accelerators
 
Ion Sources
 
PIG Ion Source ... High Efficiency
Multi Cusp Ion Source ... High brightness
 
Focused Ion Beam Line
 
Micro beam under 5um is available.
Applications
 
PBW
 
Micro-fabrication for resist with focused ion beam
    Click to enlarge
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  Click to enlarge
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Verbal Explanation
 
Thin Film Analysis
 
RBS(Rutherford Backscattering Spectrometry)
Concentration, film thickness and crystallinity can be analyzed by detecting scattered ions.


HRBS(High-resolution RBS)
High resolution RBS that has angstrom level depth resolution.
This is also called MEIS(Medium Energy Ion Scattering).


ERDA(Elastic Recoiled Detection Analysis)

Concentration for light elements such as Hydrogen can be analyed by detecting ions recoiled by incident ions.
If recoiled ion is Hydrogen, this is called HFS(Hydrogen Forward Scattering).


HERDA(High-resolution ERDA)

High resolution ERDA that has angstrom level depth resolution.

PIXE(Particle Induced X-ray Emission)
Concentration can be analyzed by characteristic X-Ray radiated by incident ion.
This is high sensitiviy(ppm) and helpful for minor elements. But distribution is not available.


NRA(Nuclear Reaction Analysis)
Concentration can be analyzed by secondary radiation by nuclear reaction between ion beam and.
elements of analyzed sample.
This is mainly used to analzye light elements whose atomic number is smaller than or equal to 15.


To Analysis Examples
 
Ion Accelerators
 
Cockcroft-Walton
Our acceleratos are Cockcroct-Walton.
By multistage combination between condencer and diode, high voltage AC can be acquired.


Van de Graaff
This consits of circinate gum belt made of dielectric materials, drive unit and hollow metal ball.
The gum belt located away from the ball is charged and leaded to the metal ball.
Then, by principle of Faraday gauge, charge is moved to the metal ball and the metal ball is charged.


Pelletron
Improved Van de Graaff. Instead of gum belt used in Van de Graaff, chain with metal pellet connected by dielectric materials is used. Thanks to this system, higher voltage was achieved.

Disktron
Improved Van de Graaff. This is similar to Pelletron. Instead of gum belt used in Van de Graaff, pellet arranged on disk is used.
 
Ion Sources
 
PIG(Penning Ionization Gauge)
This is used for our accelerators. This has high plasma efficiency and the structure is simple.


Multi Cusp
Surface plasma source trapped by multi cusp magnetic field. We are now developping. High brightness.

Duo Plasma
Plasma is generated by cathode arc discharge.

ECR(Electron Cyclotron Resonance)
Plasma is generated by electron cyclotron resonance. Multi charged ions can be generated.
In addition, beam can be generated by not only both gass and solid, but also any kinds of specimen.

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