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Sintering HIP Equipment
This equipment allows sintering and HIP treatment in a series of thermal cycles, which results in less energy loss compared with the case of processing with two independent equipment.
Sintering HIP Equipment
Typical Specifications
Medium-Scale Equipment PSF5603 |
Large-Scale Equipment PSF7001 |
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Main Specification | Pressure x Temperature | Vacuum X 1600°C 29.4MPa X 1600°C (300kgf/cm2) |
Vacuum X 1600°C 9.8MPa X 1600°C (100kgf/cm2) |
Heater Configuration | 2-Zone Graphite Heater | 3-Zone Graphite Heater | |
Material Dimensions | Φ300mm X 500mmL | Φ420mm X 1170mmL | |
Thermal Uniformity (°C) | Vacuum X 1450°C : 10°C or less 9.8MPa X 1600°C (100kgf/cm2) : 10°C or less |
Vacuum X 1450°C : 10°C or less 9.8MPa X 1600°C (100kgf/cm2) : 10°C or less |
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Vacuum Evacuation System | Achieving Time | Within 15 Minutes At 0.133Pa | Within 15 Minutes At 0.133Pa |
Leak Rate | 1.33 X 10-4Pam3/s or less | 1.33 X 10-4Pam3/s or less |
Medium-and Large-Scale HIP Equipment
Standard Small-Scale HIP Equipment
Dr. Series
Sintering HIP Equipment
Ultra High Temperature / Ultra High Pressure HIP Equipment
Other HIP Equipment
Metal Capsule Manufacturing Equipment
Compound Semiconductor Single Crystal Manufacturing Equipment