Semiconductor wafer inspecting devices

Wafer Production

Flatness Measurement System (For Sliced, Rapped and Ground Wafer, For Polished Wafer)

The flatness and shape of wafers are measured with high precision

A range of flatness measurement system is available, from line-scanning type (SBW series) to ultrahigh precision models capable of measuring site flatness (LSW series), and the LNSW series with a nanotopography function for inspecting shipments.

Responsible Company: Kobelco Research Institute, Inc.

Measurement examples

Examples of flatness measurement result
Examples of nanotopography measurement result

Product line-up

SBW series

SBW-330
Features
  • With our unique measurement method, thickness variation, bow, and warp can be measured with high precision with a simple configuration.
  • In accordance with the measuring object, the method can be selected from capacitive sensing method, laser displacement meter method, or other methods.
Usage
  • On-site control of flatness and warp after slicing, grinding, etching, and polishing.

LSW, LNSW series

LSW-3020FE
Features
  • Reproducibility at the sub-nano level is realized by our own developed super-precision heterodyne Interferometer.
  • Global flatness (such as GBIR), site flatness (such as SFQR), bow, and warp can be measured.
    LNSW can measure nanotopography.
Usage
  • High precision flatness measurement after polishing and inspection when shipping

Edge-related inspection devices (edge shape, bonding misalignment, and chipping)

The shapes of edges and notches are measured with high precision by our unique optical image processing technologies.

With the LEP series, the chamfered shape, orientation flat length, diameter, thickness, notch shape, etc. of wafers can be automatically measured without contact. In addition to this, the EMB series can measure wafer bonding misalignment, and the LEI series can inspect chipping.

Responsible Company: Kobelco Research Institute, Inc.

Measurement examples

Example of edge shape measurement result
Measurement image of wafer bonding misalignment
Chipping inspection

Product line-up

LEP series

LEP-2200FE
Features
  • Edge shape can be measured with high precision by our unique algorithm.
Usage
  • Quality confirmation immediately after edge processing, shipment inspection, performance confirmation of processing machines, etc.

EPB series

EPB-2000M/T
Features
  • Owing to edge measurement technologies and notch position measurement, bonding misalignment of wafers without an alignment mark can be measured.
Usage
  • Inspection in the bonding process, etc.

LEI series

Features
  • Fine images of a wafer’s entire circumference obtained by a high sensitivity line scanning camera can be stored.
Usage
  • Detection of defects (chip), cracks, and scars formed in the wafer edge portion, and judgement of acceptable/unacceptable

List of life time measuring devices

Life time of carrier recombination is measured.

Life time is an important parameter strongly affected by contaminants in the sample, crystal defects, etc.

Responsible Company: Kobelco Research Institute, Inc.

Measurement examples

Decrease in the life time due to wafer contamination (blue portion)

Contamination in the wafer holding portion
Contamination of oxidation furnace boat

Product line-up

LTA series

LTA-2200EP/F
Features
  • Temporal change of the carrier injected into the sample by laser beam is detected by microwave reflection power (μ-PCD method).
  • By using the differential μ-PCD method, the life time of epi/diffusion wafers with low resistivity substrates can be measured.
Usage
  • Understanding contamination and defects during polishing, cleaning, oxidation, and diffusion processes for Si/SiC:bulk, epi, epi sub and SOI wafers, control of epi furnace, inspection when receiving/shipping, etc.

Magic mirror

Fine irregularities formed on mirror surfaces can be displayed with a clear image.

With the MIS series using the magic mirror principle, abnormalities in wafer surface shape can be easily detected.

Responsible Company: Kobelco Research Institute, Inc.

Measurement examples

Surface roughness
Dislocation
Edge cracks
Polishing marks
Dimple (concave: white spots),
convex (black spots)

Product line-up

MIS series

MIS-3020
Features
  • Slightly convex/concave surfaces, surface roughness, waviness, stepping, edge chipping, etc. can be observed on the monitor as a gray image.
  • Automatic judgement is also possible by image processing.
Usage
  • Observation of surface roughness, convex/concave surfaces, polishing marks, edge chipping, etc. in the wafer production process

    Example: post-grinding inspection (a defective wafer can be detected before polishing; fast measurement speed helps 100% inspection)

Contact Us

You can reach us by clicking the inquiry button.